{"rewrite":{"id":"r_c32a5d04fc49b0d7dd9d1585","clusterId":"c_e4124d4b9dae84e651d7ffd3","slug":"chinese-company-prinano-makes-optical-chips-without-asml-gear","model":"deepseek-v4-flash","headline":"Chinese Company Prinano Makes Optical Chips Without Asml Gear","summary":"Chinese startup PRINANO announced it has manufactured 8-inch optical chip wafers using its own nanoimprint lithography equipment, without deep ultraviolet exposure tools from ASML. The company claims the process cuts costs to about one-tenth. No production volume or yield data has been disclosed, and analysts say the technology is unlikely to challenge ASML's dominance in cutting-edge chip manufacturing.","whyItMatters":"The announcement offers a potential workaround for Chinese semiconductor firms blocked from importing ASML's advanced lithography equipment, but the lack of commercial-scale data and analyst skepticism suggest the breakthrough is far from disrupting the market.","webCardHtml":"\u003cp\u003ePRINANO, a Chinese startup specializing in nanoimprint lithography (NIL), said on June 5 that it had produced 8-inch optical chip wafers using its PL-AS vacuum air-cushion nanoimprint system, which it claims achieves resolution below 10 nm. The company stated on WeChat that the process avoided deep ultraviolet exposure equipment entirely and reduced costs to roughly one-tenth of conventional methods, making it suitable for optical communications and LiDAR chips at the wafer level.\u003c/p\u003e\u003cp\u003eThe announcement comes as Chinese firms face restrictions on purchasing ASML\u0026#39;s advanced semiconductor manufacturing gear, following U.S.-led export controls. PRINANO had previously reported delivering NIL equipment to domestic customers in September 2025, signaling a move from research to production.\u003c/p\u003e\u003cp\u003eHowever, the company has not released data on throughput or yield, and analysts at SemiAnalysis argue that NIL\u0026#39;s true cost advantage depends on factors like template manufacturing and process integration, and that it is unlikely to replace EUV lithography for cutting-edge logic chips. Other companies, including Canon, Dai Nippon Printing, and Kioxia, are also developing NIL technology for memory manufacturing.\u003c/p\u003e","blueskyPost":"Prinano's optical chip wafers were made without Asml gear, but the lack of disclosed yield data leaves the cost claim unverified.","twitterPost":"Prinano made optical chips without Asml gear. No yield data disclosed means the cost claim is unverified.","threadsPost":"Prinano says it cut optical chip costs to one-tenth by using its own nanoimprint lithography instead of Asml's deep UV tools. But without yield or volume data, the cost claim is a promise, not a fact.","newsletterBlurb":"PRINANO announced it manufactured 8-inch optical chip wafers using its own nanoimprint lithography equipment, avoiding ASML's restricted deep ultraviolet exposure tools. The company claims costs are reduced to one-tenth, but has not disclosed production volume or yield. Analysts say the technology is unlikely to displace ASML in advanced chipmaking.","attributionJson":"[{\"source\":\"GIGAZINE\",\"url\":\"https://gigazine.net/news/20260610-china-prinano-chip-without-asml/\",\"title\":\"Chinese company succeeds in manufacturing optical chips without using UV exposure equipment, could be a ray of hope for China's semiconductor industry unable to import ASML equipment\"}]","lintFlagsJson":null,"lintHits":0,"costUsd":0,"inputTokens":4212,"outputTokens":694,"status":"published","repairAttempts":0,"nextRepairAt":null,"factsAttemptedAt":1781074173,"createdAt":"2026-06-10T06:40:57.000Z","publishedAt":"2026-06-10T06:45:33.000Z","updatedAt":"2026-06-10T06:45:33.000Z"},"cluster":{"id":"c_e4124d4b9dae84e651d7ffd3","canonicalTitle":"中国企業がUV露光装置を使わずに光チップの製造に成功、ASML製装置を輸入できない中国半導体業界にとって光明となるか","representativeArticleId":"a_09c7e913c01a36a35cbd6a38","sourceCount":1,"writtenSourceCount":1,"writeAttempts":0,"isSolo":true,"entitiesJson":"{\"anime_titles\":[],\"manga_titles\":[],\"work_titles\":[],\"studios\":[],\"people\":[],\"type\":\"news\",\"domain\":\"other\",\"is_roundup\":false}","contentType":"news","status":"published","firstSeenAt":"2026-06-10T06:00:00.000Z","lastSeenAt":"2026-06-10T06:00:00.000Z","updatedAt":"2026-06-10T06:45:33.000Z"},"attribution":[{"source":"GIGAZINE","url":"https://gigazine.net/news/20260610-china-prinano-chip-without-asml/","title":"中国企業がUV露光装置を使わずに光チップの製造に成功、ASML製装置を輸入できない中国半導体業界にとって光明となるか"}],"entities":{"anime_titles":[],"manga_titles":[],"work_titles":[],"studios":[],"people":[],"type":"news","domain":"other","is_roundup":false},"keyFacts":["Chinese startup PRINANO said on June 5 it produced 8-inch optical chip wafers using its PL-AS vacuum air-cushion nanoimprint system, which it claims achieves resolution below 10 nm.","PRINANO stated on WeChat that the process avoided deep ultraviolet exposure equipment from ASML and reduced costs to roughly one-tenth of conventional methods.","The company previously reported delivering nanoimprint lithography equipment to domestic customers in September 2025.","PRINANO has not released data on throughput or yield, and analysts at SemiAnalysis argue the technology is unlikely to replace EUV lithography for cutting-edge logic chips.","Other companies, including Canon, Dai Nippon Printing, and Kioxia, are also developing nanoimprint lithography for memory manufacturing."]}